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NF3

Product number：

NF3

Features

Nitrogen trifluoride is the gas used to remove the residue from the inner wall of the cabin in the Chemical Vapor Deposition (CVD) process of manufacturing semiconductors, liquid crystal displays and solar cells. 
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Product Details

Filling container：47 L cyl, 16 cyl bundle, 440 L, 20 ft ISO, 40 ft ISO

Type of valve: Meet different needs of customers 

NF3 electronic grade nitrogen trifluoride 4N-4N5 

Application 

Nitrogen trifluoride is the gas used to remove the residue from the inner wall of the cabin in the Chemical Vapor Deposition (CVD) process of manufacturing semiconductors, liquid crystal displays and solar cells. 

Production capacity 

2000t/year (after the 4,600t project is completed, it can reach 5,000t/year) 

Product index 

Project name 

NF3 10-2

CF4 10-6

N2 10-6

O2+Ar 10-6

CO 10-6

CO210-6

N2O 10-6

SF6 10-6

HF 10-6

H20 10-6

GB/T 21287-2007

≥99.99

≤50

≤10

≤5

≤5

≤5

≤5

≤5

≤1

≤1

Q/CHC 001-2020

≥99.99

≤40

≤5

≤3

≤1

≤5

≤5

≤5

≤1

≤1

Packing specifications 

Cylinder volume

43L/47L

440L/470L

20ft ISO

40ft ISO

Cylinder capacity 

20kg

200kg

4000kg

8000kg

Bottle specification 

CGA330/DIWW640/JIS22R

CGA330/DISS640/JIS22R

DISS640

DISS640

Keywords: gas products, electronic special gas

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